Dr. Kazuhiko ENDO
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan
Kazuhiko Endo is a group leader in the Advanced Materials and Devices Integration Group,Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, Japan. He received a Ph. D. degree in electrical engineering from the Waseda University in 1999. His research interests include nanometer-scale manufacturing for aggressively scaled multi-gate devices in advanced CMOS technologies. Prior to joining AIST, he was with Silicon Systems Research Laboratories, NEC Corporation from 1993 to 2003 where he worked on the research and development of multilevel interconnects and high-k gate-stack technologies for ULSI. He was a visiting scholar at the Stanford University (1999) and at the Universtity of California Santa Barbara (2015).